Anti-Reflective Coating for Flexible Devices using Plasma Enhanced Chemical Vapor Deposition Technique

In this work, high performance anti-reflective coating (ARC) is achieved at growth temperature of 100°C, which is the lowest using plasma enhanced chemical vapor deposition (PECVD) on flexible substrate reported so far. PECVD... [ view full abstract ]

In this work, high performance anti-reflective coating (ARC) is achieved at growth temperature of 100°C, which is the lowest using plasma enhanced chemical vapor deposition (PECVD) on flexible substrate reported so far. PECVD is used to deposit double-layer ARC (DLARC) of SiOx and SiNx (wavelengths between 600 nm and 700 nm) on nylon-6. Optical parameters of different deposited layers are controlled by varying gas flow ratio, growth temperature and chamber pressure. It has been observed that the bare nylon-6 has a reflection of about 4% itself, and with the DLARC the reflection of light is reduced by about 50%.